Jafari Reza, Tatoulian M., Morscheidt W. et Arefi-Khonsari F.. (2006). Stable Polymerized Acrylic Acid coating deposited on Polyethylene (PE) films in a low frequency discharge. Reactive and Functional Polymers, 66, (12), p. 1757-1765.
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URL officielle: https://doi.org/10.1016/j.reactfunctpolym.2006.08....
Résumé
Plasma polymerized acrylic acid (PPAA) coatings were deposited on PE films, in a 70 kHz low pressure plasma reactor, at various plasma powers. The COOH retention of PPAA coatings and its stability to washing in water were investigated by XPS, WCA (water contact angle), FTIR, ellipsometry and SEM analyses. The results have shown that the use of higher powers leads to an increase of the stability of the coating due to a high degree of cross-linking. Under optimized conditions, it is possible to obtain stable PPAA coatings which resist to washing with a COOH retention rate of 15% on PE, which is much higher than the coating deposited in a 13.56 MHz discharge. This high stability of the coatings observed in the low frequency discharge, which is somewhat similar to DC glow discharges, is probably due to the ions which play an important role in the cross linking process of the coatings. Optical emission spectroscopy measurements (OES) have shown good correlation between the CO density in the gas phase and the carboxylic content of PPAA coating.
Type de document: | Article publié dans une revue avec comité d'évaluation |
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Volume: | 66 |
Numéro: | 12 |
Pages: | p. 1757-1765 |
Version évaluée par les pairs: | Oui |
Date: | Décembre 2006 |
Sujets: | Sciences naturelles et génie > Génie Sciences naturelles et génie > Génie > Génie des matériaux et génie métallurgique Sciences naturelles et génie > Sciences appliquées |
Département, module, service et unité de recherche: | Départements et modules > Département des sciences appliquées > Module d'ingénierie |
Mots-clés: | water stability, plasma polymerization, acrylic acid, carboxylic groups, stabilité de l'eau, polymérisation plasma, acide acrylique, groupes carboxyliques |
Déposé le: | 28 avr. 2022 13:52 |
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Dernière modification: | 28 avr. 2022 13:52 |
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